Fabrication of High TCR TaAl-N Thin Film by Reactive Sputtering Method
نویسندگان
چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: Shinku
سال: 2007
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.50.173